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| Place of Origin: | Hunan, China |
| Brand Name: | Infi |
| Model Number: | JSD |
| Minimum Order Quantity: | 10pcs |
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| Price: | To be negotiated |
| Packaging Details: | packed in box then into carton |
| Delivery Time: | 7 working days |
| Payment Terms: | T/T, Western Union, PayPal |
| Supply Ability: | 100pcs/7days |
| Hardness (microhardness): | 80～150GPa | Young's Modulus: | 1150～130OGPa |
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| Coefficient Of Friction: | 0.05~0.05 | Thermal Expansion Coefficient: | 10-.K-l |
| Thermal Conductivity: | 1500-2000 W/ (m·K) | Nitrogen Content: | <50ppm |
| Color: | Colorless | Crystal Growth Process: | CVD |
| Highlight: | MPCVD Rough Mechanical CVD Diamond,CVD Lab Created VVS Diamonds,Lab Created VVS Diamonds Colorless |
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Product description:
Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond that is produced using the CVD process. In this process, a mixture of carbon-containing gases is decomposed under controlled conditions, resulting in the formation of a single crystal diamond layer on a substrate.
Single crystal diamond CVD is known for its exceptional hardness and thermal conductivity, which makes it useful for a range of industrial and scientific applications, such as cutting and grinding tools, heat spreaders, and optical components.
Compared to other forms of synthetic diamond, single crystal diamond CVD has a highly ordered crystal structure, which gives it improved physical and mechanical properties. This makes it a desirable material for a range of high-performance applications, where its hardness and thermal conductivity are important factors.
In summary, single crystal diamond CVD is a type of synthetic diamond that is produced using the CVD process and is characterized by its exceptional hardness and thermal conductivity. It has a wide range of applications in industries such as manufacturing, electronics, and optics.
Using the microwave plasma-assisted chemical vapor deposition method (MPACVD), the microwave resonance system is used to break down the carbon-containing gas and corrosive gas at low and medium pressures to generate plasma, and the growth strategy of the single-crystal diamond crystal model is designed, so that the diamond crystal can be used Homoepitaxial growth is achieved in the 100 and 110 and 111 growth directions of the type IIb diamond seed crystal
Size Available:
| Suggested application | Sustrated/seeds for single crystal CVD growth |
| Crystal growth process: | CVD |
| Color: | Colorless |
| Available size : | 3x3x0.3 4x4x0.3 5x5x0.3 6x6x0.3 7x7x0.3 8x8x0.3 9x9x0.6 10x10x0.3 11x11x0.3 12x12x0.3 13x13x0.3 15x15x0.3 |
| Benefits: | The length, width and thickness are all positive tolerance, |
| There are no polycrystalline black spots, cracks under the 20x magnifying glass. | |
| The cutting is perfect without small missing corners. | |
| The stress distribution is uniform under the polarizer. | |
| Orientation: | 4pt/100 |
| Lateral Dimensions Measured | to smaller side |
| Edges | Laser Cut |
| Edge Orientation | <100> edges |
| Face Orientation | {100} faces |
| Lateral Tolerance: | L + W tolerance (0, +0.3 mm), thickness tolerance (0, +0.1mm). |
| Side 1, Roughness, Ra | Two sides polished, Ra < 20 nm One side polished, Unpolished |
| Boron Concentration [B]: | <0.05 ppm |
| Nitrogen Concentration: | < 20 ppm |
Product Image:
Contact Person: Mrs. Alice Wang
Tel: + 86 13574841950
